Thin film deposition equipment
This system is equiped of a box shape chamber with a front door, for up to 3″ standardized substrates to manufacture thin solid films or coatings films in High Vacuum (<10-6 mbar obtained by Tubomolecular and dry primary pumps). All materials can be deposited for films (metal, oxide, chalcogenide, ..) since the coatings or films can be manufactured with independent regulation of deposition rate by quartz monitoring Inficon system either
-by the Ferrotec-Genius Electron beam system (10kV) with 6 separate crucibles of 20cm3 for the more refractory materials to obtain Electron Beam Deposition (EBD) mode
- by one thermal source (EJ) for "less refractory materials".
Much possibilities can be envisaged with this evaporator machine as :
-to manufacture optical coatings for UV-Visible-PIR and MIR applications
-to manufacture « crystallised film » by heating during deposition substrate with a furnace (<800°C) or by post heat treatment static or dynamic with the standard gaz (02, N2, Ar).
All steps to manufacture « coatings » can be controlled by Plassys software either by semi automatic or automatic procedures of deposition sequence.
Campus : Beaulieu
Build: 10 B
In charge : Michel Cathelinaud
Malvern Zetasizer Nano ZS is a Zeta-meter and particule sizer
Size between 0.3nm and 10µm